Electrostatic chuck has the function of normal use in vacuum atmosphere, and plays the role of holding and temperature control of wafer in high vacuum plasma or special gas environment, assisting semiconductor process equipment to realize the change of electrical characteristics and physical form of specific areas of wafer, so that it presents specific functions. And through a series of other complex and demanding processes to eventually turn the wafer into a complex integrated circuit structure. Electrostatic chuck and electrostatic chuck heater are widely used in semiconductor core process, and are one of the core components of ion implantation, etching, vapor deposition of key processes.